US Patent Issued to Research & Business Foundation Sungkyunkwan University on Aug. 12 for "Apparatus and method for forming fine pattern" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,386,283, issued on Aug. 12, was assigned to Research & Business Foundation Sungkyunkwan University (Suwon-si, South Korea).

"Apparatus and method for forming fine pattern" was invented by DaeJoon Kang (Suwon-si, South Korea), JaeSeok Hwang (Suwon-si, South Korea) and HyungJe Park (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are an apparatus and method for forming a fine pattern. The apparatus for forming the fine pattern includes a lower electrode disposed on a bottom face of a fluid thin-film; an upper electrode positioned above the lower electrode, and spaced apart from the lower electrode by a first spacing, wherein...