ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,447,220, issued on Oct. 21, was assigned to Rensselaer Polytechnic Institute (Troy, N.Y.).

"UVC irradiation disinfection systems and methods" was invented by Robert F. Karlicek Jr. (Mechanicville, N.Y.), Mohammed Alnaggar (Niskayuna, N.Y.) and Arunas Tuzikas (Yorktown, Va.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A disinfection system includes a first UVC radiation source and a second opposing UVC radiation source. The first and second UVC radiation sources are positioned such that a gap exists therebetween. The first UVC radiation source is configured to emit UVC radiation across the gap toward the second UVC radiation source and the second UVC r...