US Patent Issued to RENESAS ELECTRONICS on June 10 for "Resistor material, resistor element and method of manufacturing the resistor element" (Japanese Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,665, issued on June 10, was assigned to RENESAS ELECTRONICS Corp. (Tokyo).

"Resistor material, resistor element and method of manufacturing the resistor element" was invented by Nozomi Ito (Tokyo), Yorinobu Kunimune (Tokyo), Kenichiro Abe (Tokyo) and Nobuhito Shiraishi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A resistor material including a plurality of crystalline phases having a positive temperature coefficient of resistance, and an amorphous phase having a negative temperature coefficient of resistance and having a resistivity higher than the crystalline phase, in a mixed state, is provided. Moreover, a resistor element having a resi...