ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,469,633, issued on Nov. 11, was assigned to Realtek Semiconductor Corp. (Hsinchu, Taiwan).
"Inductor device" was invented by Hsiao-Tsung Yen (Hsinchu, Taiwan) and Ka-Un Chan (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An inductor device includes a first trace, a second trace, a third trace, a fourth trace, and a double ring inductor. The first trace is disposed in a first area, and located on a first layer. The second trace is disposed in the first area, coupled to the first trace, and located on a second layer. The third trace is disposed in a second area, and located on the first layer. The fourth trace is disposed in the second ar...