ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,534,801, issued on Jan. 27, was assigned to RC-Tech Co. Ltd. (Yongin-si, South Korea).
"Chemical supply device and chemical supply system including the same" was invented by Tae Hwa Lim (Yongin-si, South Korea), Myeong Mun Kim (Incheon, South Korea) and Jee Hun Kim (Icheon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "According to one embodiment, a chemical supply device includes: a bubbler configured to contain a chemical solution which is used in a semiconductor process and to receive an input gas for vaporizing the chemical solution into an output gas; a constant-temperature bath configured to contain the bubbler and to adjust a temp...