US Patent Issued to Raytheon on April 29 for "Application and method of integrated bar patterns in detector structures" (California Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,288,795, issued on April 29, was assigned to Raytheon Co. (Arlington, Va.).

"Application and method of integrated bar patterns in detector structures" was invented by Jamal I. Mustafa (Goleta, Calif.) and Richard J. Peralta (Goleta, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An optical device and method of forming the optical device include a substrate having an integrated metal pattern proximate a detector or top absorber layer to minimize diffraction effects. The integrated metal pattern is aligned with selective regions of the pixel array structure of the detector layer for masking pixels of the pixel array structure. The pattern of the int...