ALEXANDRIA, Va., June 18 -- United States Patent no. 12,325,640, issued on June 10, was assigned to QUARZWERKE GmbH (Frenchen, Germany).
"Sequestering of crystalline silicon dioxide" was invented by Jorg Ulrich Zilles (Cologne, Germany), Max Kellermann (Wesseling, Germany) and Paul Paez-Maletz (Frenchen, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A process for treating crystalline silicon dioxide, comprising the step of grinding a crystalline silicon dioxide together with from 0.05 to 1.00% by weight of a substance selected from the group consisting of polyhydric alcohols, kaolin, aluminum alcoholates, and mixtures thereof."
The patent was filed on Jan. 30, 2020, under Application No. 17/426,461...