ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,379,327, issued on Aug. 5, was assigned to PVA TEPLA AG (Wettenberg, Germany).
"High precision VPD-DC scan" was invented by Robert Beikler (Wettenberg, Germany), William Mande (Wettenberg, Germany) and Walter Boehme (Wettenberg, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to a method and system for performing VPD-DC on wafer surfaces, wherein the pipette substitutes for the function of the scan tube and is operated such that a bulge of scanning liquid protrudes from the pipette channel and contacts the wafer surface for scanning."
The patent was filed on Sept. 9, 2022, under Application No. 17/941,032.
*For further info...