ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,417, issued on Sept. 23, was assigned to PSK INC. (Hwaseong-si, South Korea).
"Substrate processing apparatus and substrate processing method" was invented by Kwang Sung Yoo (Hwaseong-si, South Korea), Tae Hwan Youn (Hwaseong-si, South Korea) and Geon Jong Kim (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides an apparatus for treating a substrate. The apparatus includes a chuck supporting the substrate, a gas supply unit configured to supply a process gas to an edge region of the substrate, and an edge electrode provided to surround the substrate supported by the chuck when viewed from a top an...