ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,417,901, issued on Sept. 16, was assigned to PSK INC. (Hwaseong-si, South Korea).

"Apparatus for treating substrate and method for aligning dielectric plate using the same" was invented by Kwang Sung Yoo (Hwaseong-si, South Korea) and Ju Young Park (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an apparatus for treating a substrate. The apparatus for treating the substrate includes a housing defining a treatment space formed by a combination of an upper housing and a lower housing, a gas supply unit configured to supply gas to the treatment space, a support unit including a chuck configured to support the substrate...