ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,476,076, issued on Nov. 18, was assigned to PSK INC. (Gyeonggi-do, South Korea).
"Substrate processing apparatus" was invented by Chi Young Lee (Gyeonggi-do, South Korea), A Ram Kim (Gyeonggi-do, South Korea), Soo Yeong Yang (Gyeonggi-do, South Korea), Young Tak Yoon (Gyeonggi-do, South Korea), Yun Young Lee (Gyeonggi-do, South Korea) and Jin Chul Son (Gyeonggi-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an apparatus for processing a substrate, the apparatus including: a chamber having a processing space; a support unit for supporting a substrate in the processing space; a gas supply unit for supplying process gas to the p...