ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,531,216, issued on Jan. 20, was assigned to PSK INC. (Hwaseong-si, South Korea).

"Support unit and substrate processing apparatus including same" was invented by Yong Soo Yang (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides a substrate processing apparatus. The substrate processing apparatus includes a chamber defining a processing space, a gas supply unit supplying a process gas to the processing space, and a support unit supporting a substrate in the processing space, wherein the support unit includes a chuck supporting the substrate, a power applying RF power to the chuck, and an ionization pat...