ALEXANDRIA, Va., June 5 -- United States Patent no. 12,278,091, issued on April 15, was assigned to PSK INC. (Gyeonggi-do, South Korea).
"Substrate processing apparatus and substrate processing method" was invented by Kwang Sung Yoo (Hwaseong-si, South Korea), A Ram Kim (Hwaseong-si, South Korea) and Song I Han (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate processing apparatus including: a chuck configured to support a substrate; a dielectric plate disposed to face an upper surface of the substrate supported by the chuck; a gas supply unit configured to supply process gas to an edge region of the substrate; and a first edge electrode configured to generate p...