ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,487,404, issued on Dec. 2, was assigned to PSIQUANTUM CORP. (Palo Alto, Calif.).
"Patterning method for photonic devices" was invented by Henrik Johansson (Wilton, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatus for etching a wafer. The wafer is positioned adjacent to a cathode within a vacuum chamber. The wafer includes a first layer stack, where the first layer stack includes a crystalline composition of a first element and a second element different from the first element. The crystalline composition may be BaTiO3 (BTO). A gas is received that includes a first partial gas and a second partial gas. The first and second partial...