ALEXANDRIA, Va., July 30 -- United States Patent no. 12,375,815, issued on July 29, was assigned to Protochips Inc. (Morrisville, N.C.).

"Automated application of drift correction to sample studied under electron microscope" was invented by Franklin Stampley Walden II (Raleigh, N.C.), John Damiano Jr. (Holly Springs, N.C.), David P. Nackashi (Raleigh, N.C.), Daniel Stephen Gardiner (Wake Forest, N.C.), Mark Uebel (Morrisville, N.C.), Alan Philip Franks (Durham, N.C.) and Benjamin Jacobs (Apex, N.C.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Control system configured for sample tracking in an electron microscope environment registers a movement associated with a region of interest located within an active...