US Patent Issued to PROTO PATENTS on Nov. 25 for "X-ray source for X-ray diffraction apparatus, related apparatus and method" (Canadian Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,480,895, issued on Nov. 25, was assigned to PROTO PATENTS LTD. (Lasalle, Canada).

"X-ray source for X-ray diffraction apparatus, related apparatus and method" was invented by Mohammed Belassel (LaSalle, Canada), Alec Iskra (LaSalle, Canada) and Stanislav Veinberg (LaSalle, Canada).

According to the abstract* released by the U.S. Patent & Trademark Office: "There is provided an X-ray source for an X-ray diffraction apparatus. The source includes a target and a filament operable to generate an X-ray beam, a vacuum chamber, outer and inner housings and a rotation mechanism. The chamber encloses the target and the filament and has a window transparent to the beam. The outer housing is mo...