US Patent Issued to PROSEMI on May 20 for "Method for overlay control based on a semiconductor device pattern, and method and system for generating a photomask" (Taiwanese Inventor)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,546, issued on May 20, was assigned to PROSEMI Co. LTD. (Tainan, Taiwan).

"Method for overlay control based on a semiconductor device pattern, and method and system for generating a photomask" was invented by Tian-Xing Huang (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for overlay control based on a semiconductor device pattern includes: obtaining data of selected area from the semiconductor device pattern that includes a wiring section with a first pattern image and a second pattern image that are images of two wiring patterns formed in different steps in a semiconductor fabrication process; obtaining two overlay errors a...