US Patent Issued to PRODRIVE TECHNOLOGIES INNOVATION SERVICES on July 1 for "Determining an optimal ion energy for plasma processing of a dielectric substrate" (Dutch Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,347,662, issued on July 1, was assigned to PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V. (Son en Breugel, Netherlands).

"Determining an optimal ion energy for plasma processing of a dielectric substrate" was invented by Qihao Yu (Son, Netherlands), Erik Lemmen (Son, Netherlands) and Bastiaan Joannes Daniel Vermulst (Son, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ion energy for plasma processing of a dielectric substrate is determined by exposing the dielectric substrate to a plasma discharge and applying a pulsed voltage waveform. This waveform includes a sequence of pulses, each having a higher voltage interval and a lower voltage i...