ALEXANDRIA, Va., March 19 -- United States Patent no. 12,252,784, issued on March 18, was assigned to President and Fellows of Harvard College (Cambridge, Mass.).
"Copper halide layers" was invented by Christina M. Chang (Cambridge, Mass.), Luke M. Davis (Cambridge, Mass.) and Roy Gerald Gordon (Cambridge, Mass.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Articles are described including a substrate and a copper halide layer on the substrate, where the interfacial free energy between the substrate and the copper halide layer allows the copper halide layer to form continuously, wherein the copper halide layer conforms to the shape of the substrate. The articles may further include an adhesion layer dispose...