ALEXANDRIA, Va., June 25 -- United States Patent no. 12,342,636, issued on June 24, was assigned to Powerchip Semiconductor Manufacturing Corp. (Hsinchu, Taiwan).
"Manufacturing method of image sensor structure" was invented by Chien-Lung Wu (Hsinchu, Taiwan), Yu-Han Kao (New Taipei, Taiwan), Ching-Chun Chou (Hsinchu, Taiwan) and Yi-Shu Ou (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A manufacturing method of an image sensor structure including the following steps is provided. A substrate structure is provided. A first patterned hard mask layer is formed on the substrate structure. The first patterned hard mask layer has a first opening. A first ion implantation process is performed on the...