US Patent Issued to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION on Oct. 21 for "Module structure for photomicro-reactor, photomicro-reactor including the same, and method of manufacturing the same" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,447,457, issued on Oct. 21, was assigned to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION (Pohang-si, South Korea).

"Module structure for photomicro-reactor, photomicro-reactor including the same, and method of manufacturing the same" was invented by Dong-Pyo Kim (Pohang-si, South Korea) and Gwang-Noh Ahn (Anyang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a method of manufacturing a module structure for photomicro-reactors. The method of manufacturing a module structure for photomicro-reactors according to an aspect of the present invention, which is a method of manufacturing the module structure for photomicro-rea...