US Patent Issued to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION on Jan. 13 for "Shortest path search in obstacle environment" (South Korean Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,524,468, issued on Jan. 13, was assigned to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION (Pohang-si, South Korea).

"Shortest path search in obstacle environment" was invented by Hee Kap Ahn (Pohang-si, South Korea), Hyo Jeong An (Pohang-si, South Korea), Mook Kwon Jung (Pohang-si, South Korea), Tae Kang Eom (Pohang-si, South Korea) and Hwi Kim (Pohang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are embodiments of shortest path search in an obstacle environment. Provided is a shortest path search method including: creating an epsilon graph; and determining k closest points from a query point on the basis of the graph,...