US Patent Issued to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION on Feb. 10 for "Self-wetting triphase photocatalytic composite, method of preparing same, and air purification method using same" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,544,479, issued on Feb. 10, was assigned to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION (Pohang-si, South Korea).

"Self-wetting triphase photocatalytic composite, method of preparing same, and air purification method using same" was invented by Wonyong Choi (Pohang-si, South Korea) and Fei He (Pohang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Proposed is a photocatalytic complex. The photocatalytic complex includes a photocatalyst, and an iodine compound layer formed on a surface of the photocatalyst to cover the same and containing an iodine compound. The present disclosure enables selective degradation of hydrophilic volat...