US Patent Issued to POSTECH ACADEMY-INDUSTRY FOUNDATION on Nov. 25 for "Method for searching for shortest path having minimum link between buildings in rectilinear polygon obstacle environment" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,480,769, issued on Nov. 25, was assigned to POSTECH ACADEMY-INDUSTRY FOUNDATION (Pohang-si, South Korea).

"Method for searching for shortest path having minimum link between buildings in rectilinear polygon obstacle environment" was invented by Hee Kap Ahn (Pohang-si, South Korea), Tae Kang Eom (Pohang-si, South Korea), Hwi Kim (Pohang-si, South Korea) and Min Cheol Kim (Pohang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a method for searching for the shortest path having a minimum link between buildings in a rectilinear polygon obstacle environment, which has been implemented to calculate the shortes...