US Patent Issued to PNC PROCESS SYSTEMS, ULTRON SEMICONDUCTOR (SHANGHAI) on June 17 for "Liquid delivering system for wafer cleaning equipment" (Chinese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,334,368, issued on June 17, was assigned to PNC PROCESS SYSTEMS Co. LTD. (Shanghai) and ULTRON SEMICONDUCTOR (SHANGHAI) Co. LTD. (Shanghai).

"Liquid delivering system for wafer cleaning equipment" was invented by Yilin Shen (Shanghai), Xinlai Chen (Shanghai), Dawei Liu (Shanghai), Jie Wang (Shanghai), Zhengkai Lu (Shanghai), Ming Xu (Shanghai), Panpan Li (Shanghai), Fangyi Lv (Shanghai) and Chuanlong Liu (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "A liquid delivering system for wafer cleaning equipment includes an acid scouring tank, a sulfuric acid supplying source, a hydrogen peroxide supplying source, a first mixing device, a second mixi...