ALEXANDRIA, Va., June 19 -- United States Patent no. 12,332,350, issued on June 17, was assigned to PLX Inc. (Deer Park, N.Y.).
"System and method for orthogonal laser metrology" was invented by Malcolm George Humphrey (West Sussex, Great Britain) and Itai Vishnia (Setauket, N.Y.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A system, device and methodology for detecting an object and its position in a field of view of a beam fan. The system can comprise a reflection detector sensor array arranged to detect a light beam reflected by an object impinged by a beam fan in the field of view and output a reflected beam position trigger signal; a line sensor arranged to capture an image of the reflected light beam...