ALEXANDRIA, Va., July 23 -- United States Patent no. 12,368,117, issued on July 22, was assigned to PLASMA-THERM NES LLC (St. Petersburg, Fla.).

"Electrostatic discharge prevention in ion beam system" was invented by Sarpangala Hariharakeshava Hegde (Fremont, Calif.), Armin Baur (Largo, Fla.), Wei-Hua Hsiao (St. Petersburg, Fla.), Russell Westerman (Land O' Lakes, Fla.) and Jerome Michael Buckley (St. Petersburg, Fla.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides several methods for processing a substrate within a shutterless ion beam etching (IBE) system or shutterless ion assist ion beam deposition (IBD) system while preventing electrostatic damage to the substrate. In the ...