US Patent Issued to Picosun on Oct. 28 for "Atomic layer deposition reactor comprising a top-loading reaction chamber configured to carry a batch of vertically oriented substrates" (Finnish Inventor)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,454,754, issued on Oct. 28, was assigned to Picosun Oy (Espoo, Finland).

"Atomic layer deposition reactor comprising a top-loading reaction chamber configured to carry a batch of vertically oriented substrates" was invented by Sven Lindfors (Espoo, Finland).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to methods and apparatus in which precursor vapor is guided along at least one in-feed line into a reaction chamber of a deposition reactor, and material is deposited on surfaces of a batch of vertically placed substrates by establishing a vertical flow of precursor vapor in the reaction chamber and having it enter in a vertical dire...