US Patent Issued to Picosun on May 13 for "Substrate processing methods and apparatus" (Finnish Inventors)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,297,535, issued on May 13, was assigned to Picosun Oy (Espoo, Finland).

"Substrate processing methods and apparatus" was invented by Juhana Kostamo (Masala, Finland), Marko Pudas (Masala, Finland) and Timo Malinen (Masala, Finland).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and a substrate processing apparatus including a vertical flow reaction chamber, a flow guiding part and a substrate support at a horizontally central area of the reaction chamber, the substrate support residing underneath the flow guiding part, and the flow guiding part forcing the vertical flow from above the flow guiding part to go round the flow guiding part on its do...