ALEXANDRIA, Va., March 12 -- United States Patent no. 12,247,288, issued on March 11, was assigned to Picosun Oy (Espoo, Finland).
"Substrate processing apparatus and method" was invented by Vaino Kilpi (Masala, Finland) and Tom Blomberg (Masala, Finland).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus (100), comprising a reaction chamber (20) having an upper portion (20a) and a lower portion (20b) sealing an inner volume of the reaction chamber (20) for substrate processing, the lower portion (20b) being movable apart from the upper portion (20a) to form a substrate loading gap therebetween, a substrate support system comprising a support table (31) and at least one support el...