ALEXANDRIA, Va., June 18 -- United States Patent no. 12,325,915, issued on June 10, was assigned to Picosun Oy (Espoo, Finland).
"Substrate processing apparatus and method" was invented by Timo Vaha-Ojala (Masala, Finland), Vaino Kilpi (Masala, Finland), Niklas Holm (Masala, Finland) and Timo Malinen (Masala, Finland).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus, including a reaction chamber to process a substrate, a photon source to provide the reaction chamber with photons from the top side of the reaction chamber, a substrate support to support the substrate, a chemical inlet to provide the reaction chamber with a reactive chemical; and a chemical outlet to exhaust gases ...