US Patent Issued to Photo electron Soul on July 15 for "Electron beam applicator, and electron beam emission method in electron beam applicator" (Japanese Inventor)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,362,128, issued on July 15, was assigned to Photo electron Soul Inc. (Nagoya, Japan).

"Electron beam applicator, and electron beam emission method in electron beam applicator" was invented by Tomohiro Nishitani (Nagoya, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An object is to provide an electron beam applicator suitable for an electron gun having a photocathode and an electron beam emission method in the electron beam applicator. The object can be achieved by an electron beam applicator including: an electron gun section; a main body section; and a control unit. The electron gun section includes a light source, a photocathode that emits an e...