ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,451,305, issued on Oct. 21, was assigned to Peratech IP Ltd (North Yorkshire, Great Britain).
"Button structure" was invented by Xu Feng (Jiansu, China), Sun Kun (Jiansu, China), Wang Shichao (Jiansu, China) and Wei Xin (Jiansu, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "A button structure comprises a base layer, a supporting structure arranged on the base layer, an elastic film layer, the elastic film layer covering the support structure and connected to the support structure, the support structure and the elastic film layer defining a cavity above the base layer, a first upper electrode arranged on the lower surface of the elastic film layer...