ALEXANDRIA, Va., June 9 -- United States Patent no. 12,287,498, issued on April 29, was assigned to Paul Scherrer Institut (Villigen PSI, Switzerland).
"Fabrication of blazed diffractive optics by through-mask oxidation" was invented by Christian David (Lauchringen, Germany) and Vitaliy Guzenko (Baden-Wuerttemben, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for manufacturing a low-angle blazed grating on a semiconductor or silicon substrate, includes spin-coating the substrate with resist layer or hydrogen or polysilsesquioxane, being 100-1000 nm or few hundred nanometers thick, applying grayscale irradiation lithography exposure to the resist layer, generating a dose modulated pattern th...