US Patent Issued to PARK SYSTEMS on Aug. 26 for "Method for measuring, by measurement device, characteristics of surface of object to be measured, atomic force microscope for performing same method, and computer program stored in storage medium to perform same method" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,399,195, issued on Aug. 26, was assigned to PARK SYSTEMS CORP. (Suwon-si, South Korea).

"Method for measuring, by measurement device, characteristics of surface of object to be measured, atomic force microscope for performing same method, and computer program stored in storage medium to perform same method" was invented by Ahjin Jo (Seoul, South Korea), Seung Hun Baik (Seoul, South Korea), Seonghun Yun (Suwon-si, South Korea), Byoung-Woon Ahn (Anyang-si, South Korea) and Sang-il Park (Seongnam-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a method for measuring, by a measurement device, characteristics o...