ALEXANDRIA, Va., June 25 -- United States Patent no. 12,340,976, issued on June 24, was assigned to PANASONIC INTELLECTUAL PROPERTY MANAGEMENT Co. LTD. (Osaka, Japan).

"Plasma processing apparatus" was invented by Naoaki Takeda (Osaka, Japan), Shogo Okita (Hyogo, Japan), Seiya Nagano (Osaka, Japan), Toshihiro Wada (Osaka, Japan) and Takahiro Miyai (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A disclosed plasma processing apparatus 10 includes: a chamber 11 having an opening 11a; a stage 12 disposed in the chamber 11, the stage for placing an object to be processed; a dielectric member 13 closing the opening 11a; and a plasma generation unit 16 disposed on the opposite side to the chamber 11 w...