ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,532,706, issued on Jan. 20, was assigned to PANASONIC INTELLECTUAL PROPERTY MANAGEMENT Co. LTD. (Osaka, Japan).

"Plasma processing apparatus and plasma processing method" was invented by Toshiyuki Takasaki (Osaka, Japan), Shogo Okita (Hyogo, Japan) and Minghui Zhao (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus includes an ESC system having an ESC electrode, a plasma generator generating first and second plasma, a controller controlling the ESC system and the plasma generator such that a first or second processing with the first or second processing is performed on a substrate chucked to a stage, and an abnorm...