ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,230,484, issued on Feb. 18, was assigned to PANASONIC INTELLECTUAL PROPERTY MANAGEMENT Co. LTD. (Osaka, Japan).

"Plasma processing apparatus and plasma processing method" was invented by Atsushi Harikai (Osaka, Japan) and Shogo Okita (Hyogo, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus including: a chamber; a plasma generation unit configured to generate a plasma in the chamber; a stage 111 for placing a conveying carrier 10, the stage provided in the chamber; a cover 124 for covering at least part of the conveying carrier placed on the stage; a relative position change unit capable of changing a relative distance b...