ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,829, issued on Aug. 26, was assigned to PANASONIC INTELLECTUAL PROPERTY MANAGEMENT Co. LTD. (Osaka, Japan).

"Plasma processing apparatus and plasma processing method" was invented by Naoaki Takeda (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a plasma processing apparatus 10 including: a chamber 11; a high-frequency power source 19 configured to supply a high-frequency power for generating plasma in the chamber 11; a matcher connected to the high-frequency power source 19; a distributor 22 connected to the matcher 21 and configured to distribute and output the high-frequency power supplied from the high-frequency power so...