US Patent Issued to OXIDE on Sept. 30 for "Pattern inspection apparatus and pattern inspection method" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,430,740, issued on Sept. 30, was assigned to OXIDE Corp. (Hokuto, Japan).

"Pattern inspection apparatus and pattern inspection method" was invented by Shinichi Imai (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pattern inspection apparatus includes a light source, a detector, and an inspection unit. The light source is configured to emit light toward an inspection target including stacked silicon substrates. The light has a wavelength band that is greater than or equal to 1.2 micrometers and less than or equal to 5.0 micrometers. The detector is configured to detect transmitted light of the inspection target or reflected light of t...