US Patent Issued to Osaka University, ISHIHARA SANGYO on June 17 for "Compound, production method therefor, and organic semiconductor material obtained using said compound" (Japanese Inventors)

ALEXANDRIA, Va., June 19 -- United States Patent no. 12,331,062, issued on June 17, was assigned to Osaka University (Osaka, Japan) and ISHIHARA SANGYO KAISHA LTD. (Osaka, Japan).

"Compound, production method therefor, and organic semiconductor material obtained using said compound" was invented by Yutaka Ie (Osaka, Japan), Takuji Seo (Osaka, Japan), Shreyam Chatterjee (Osaka, Japan), Taichi Moriyama (Osaka, Japan) and Syun Kudo (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a compound having an excellent semiconductor property and a method for producing the compound, an intermediate of the compound and a method for producing the intermediate, and an organic semiconductor material ...