US Patent Issued to OSAKA GAS CHEMICALS on Sept. 16 for "Fluorene derivative, and production method and use for same" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,415,777, issued on Sept. 16, was assigned to OSAKA GAS CHEMICALS Co. LTD. (Osaka, Japan).

"Fluorene derivative, and production method and use for same" was invented by Yuki Ouchi (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The fluorene derivative of the present disclosure is represented by the following formula (1):Wherein R1 represents a substituent, k denotes an integer of 0 to 8, R2a, R2b, R2c, and R2d each represent a hydrogen atom or a substituent, R3a and R3b each represent a hydrogen atom or a substituent, and X1a and X1b each represent a group defined in the following formula (X1):wherein R4 and R5 each represent a hydrogen ato...