US Patent Issued to OSAKA GAS CHEMICALS on July 22 for "Retardation film and method for producing the same" (Japanese Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,366,694, issued on July 22, was assigned to OSAKA GAS CHEMICALS Co. LTD. (Osaka, Japan).

"Retardation film and method for producing the same" was invented by Yoshiya Ota (Osaka, Japan), Shinichi Kamei (Osaka, Japan) and Shinsuke Miyauchi (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a retardation film that has a high heat resistance, has excellent formability and handleability even in a single-layer structure, has a negative thickness-direction retardation Rth value, and is suitable as a negative A-plate or a positive C-plate and a method for producing the film. The retardation film is formed of a stretched film of a polyeste...