ALEXANDRIA, Va., June 19 -- United States Patent no. 12,331,210, issued on June 17, was assigned to OrelTech Ltd. (Rehovot, Israel).
"Composition for forming a patterned metal film on a substrate" was invented by Natalia Zamoshchik (Rehovot, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "A composition for forming a patterned thin metal film on a substrate is presented. The composition includes metal cations; and at least one solvent, wherein the patterned thin metal film is adhered to a surface of the substrate upon exposure of the at least metal cations to a low-energy plasma."
The patent was filed on April 18, 2023, under Application No. 18/302,531.
*For further information, including images, char...