US Patent Issued to Orbotech on June 3 for "System and method for inspection of multiple features of patterned objects in the manufacture of electrical circuits" (Israeli Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,320,758, issued on June 3, was assigned to Orbotech Ltd. (Yavne, Israel).

"System and method for inspection of multiple features of patterned objects in the manufacture of electrical circuits" was invented by Vered Gatt (Rehovot, Israel), Itzhak Saki Hakim (Kfar Saba, Israel), Chay Goldenberg (Tel Aviv, Israel) and Mordehay Amirim (Tkuma, Israel).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for inspection of multiple features of patterned objects in the manufacture of electrical circuits, the method including performing defect detection on the patterned object, employing an optical defect detection machine (ODDM) and employing the ODDM to measu...