ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,493,245, issued on Dec. 9, was assigned to Orbotech Ltd. (Yavne, Israel).
"Enhancing efficiency of resist patterning" was invented by Ofer Fogel (Yavne, Israel), Manuela Hod (Yavne, Israel), Uri Gold (Yavne, Israel) and Ronen Yogev (Yavne, Israel).
According to the abstract* released by the U.S. Patent & Trademark Office: "A direct imaging system includes an ultraviolet radiation source, which is configured to irradiate a first area, having a first width, of a layer of a photoreactive material on a substrate with patterned ultraviolet radiation. A thermal energy source is configured to heat a second area of the layer of the photoreactive material while the ultraviolet radiation source...