ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,499,027, issued on Dec. 16, was assigned to Oracle International Corp. (Redwood Shores, Calif.).

"Models for detecting and managing excessive log patterns" was invented by Nagarajan Muthukrishnan (Foster City, Calif.), Ravi Shankar Thammaiah (Redwood City, Calif.), Sumanta Kumar Chatterjee (Menlo Park, Calif.), Binoy Sukumaran (Foster City, Calif.), Abhishek Chitre (Karnataka, India) and Mohit Singal (Karnataka, India).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments described herein include a log management system that detects and addresses excessive log patterns at runtime. In some embodiments, the log management system tracks cumulative attr...