US Patent Issued to OPTOMED on Sept. 16 for "Focus measuring arrangement and method of ophthalmic examination, and ophthalmic examination apparatus and method" (Finnish Inventors)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,414,689, issued on Sept. 16, was assigned to OPTOMED PLC (Oulu, Finland).

"Focus measuring arrangement and method of ophthalmic examination, and ophthalmic examination apparatus and method" was invented by Ilkka Alasaarela (Oulu, Finland), Kalle Saippa (Oulu, Finland), Juha Lipponen (Oulu, Finland) and Seppo Ronkko (Oulu, Finland).

According to the abstract* released by the U.S. Patent & Trademark Office: "A focus measuring arrangement for ophthalmic examination comprises an infrared light source system, which directs infrared light to a pupil of an eye of a person and forms a focusing pattern of the infrared light on a retina. A receiving arrangement apertures receives the infrared...