US Patent Issued to Onto Innovation on Oct. 14 for "Deep learning model in high-mix semiconductor manufacturing" (Texas Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,443,153, issued on Oct. 14, was assigned to Onto Innovation Inc. (Wilmington, Mass.).

"Deep learning model in high-mix semiconductor manufacturing" was invented by Yulei Sun (Flower Mound, Texas), Shelby Crain (Sachse, Texas) and Stephen McWilliams (Carrollton, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed techniques for applying a neural network deep learning model in a fabrication strategy for high-mix semiconductor manufacturing, such as deposition, chemical-mechanical polishing (CMP), etching, photolithography, plating, etc. Training and normal operation modes of the fabrication strategy are described."

The patent was filed on Sept...