US Patent Issued to Onto Innovation on Nov. 18 for "System and method for performing alignment and overlay measurement through an opaque layer" (New Jersey, Oregon, Illinois Inventors)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,643, issued on Nov. 18, was assigned to Onto Innovation Inc. (Wilmington, Mass.).

"System and method for performing alignment and overlay measurement through an opaque layer" was invented by Manjusha Mehendale (Morristown, N.J.), George Andrew Antonelli (Portland, Ore.), Priya Mukundhan (Lake Hopatcong, N.J.), Robin A. Mair (West Chicago, Ill.) and Francis C. Vozzo (Randolph, N.J.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An alignment or overlay target that has an optically opaque layer disposed between the top and bottom target structure is measured using opto-acoustic metrology. A classifier library is generated for classifying whether an opt...